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**See our new Easytube™ 101 configurator - our friendly, low cost, equipment/process solution for the researcher that has a limited budget.**

First Nano, a Division of CVD Equipment Corporation, manufactures turnkey thermal CVD and PECVD systems to meet the research and production needs in nanotechnology, solar, semiconductor and MEMS industries.

Our EasyTube™ systems, used for nanomaterial growth, include:

EasyTube™ systems are also used in thin film deposition including Silicon Germanium (SiGe), amorphous Silicon, micro-crystalline Silicon, graphene, Silicon Oxide, Silicon Nitride, TCO coating on glass and much more.

We provide turnkey solutions with our EasyTube™ CVD systems, EasyGas™ cabinets, EasyPanels™, and EasyExhaust™ Gas Conditioning Systems (scrubber).

We also provide access to our Application Lab where Nano/Solar/Energy material processes can be developed in conjunction with First Nano/CVD research scientists. Please visit our Application Lab page for fees and more information.

Upcoming Shows & Conferences

EXHIBITNG:

MRS 2010 Fall   Meeting
2010 MRS Fall Meeting
Nov. 30th - Dec. 2nd
Boston, MA
Booth #TBA

More 2010 Tradeshows

First Nano Application Lab

Application Notes

Papers

EasyPanel™ System

easypanel uhp gas panel

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

easyexhaust system - high temp furnace and water scrubbing system

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
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EasyGas™ 1000

easygas 1000 gas cabinet

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

easygas 1500 gas cabinet

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube™ 101

easytube 101 advanced cvd process tool

Advanced CVD process development tool for the University or Industrial Researcher...
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EasyTube™ 2000

easytube 2000 thermal cvd

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube™ 2000 - VACNT Array

vertically aligned CNT

Vertically Aligned CNT array...
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EasyTube™ 2000 - Fastcool™ Furnace

high throughput furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
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EasyTube™ 2000 - Automated Wafer Loading

easytube 2000 Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube™ 2000 - Hot Loader and FastCool™ Furnace

Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
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EasyTube™ 3000

easytube 3000 cnt and nanowire cvd system

Advanced Catalytic CNT and Nanowire CVD System process tool for...
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EasyTube™ 3000 - RF Plasma

easytube 3000 rf plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube™ 3000 - CNT Batch Synthesis

EasyTube™ 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4" wafers...
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EasyTube™ 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
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EasyTube™ 3000 - Infrared Heating Furnace

EasyTube™ 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
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EasyTube™ 4000

easytube 4000 advanced plasma cvd system

Advanced Plasma Enhanced CVD process tool for the synthesis of...
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EasyTube™ 4000 - PECVD Deposition Chamber

EasyTube™ 4000 - PECVD Deposition Chamber

PECVD Deposition chamber for a 4", 6" or 8" wafer...
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EasyTube™ 6000

easytube 6000 advanced multi furnace system

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
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EasyTube™ 6000 - Batch Wafer Process

EasyTube™ 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
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Customer Testimonials

"CVD’s core processes and application lab have enabled us to bring solutions and refinements to areas of our process development which have allowed us to accelerate the commercialization of our product..."

-Larry Bawden
CEO
Bloo Solar   

 More Testimonials

7/12/10
EasyTube™ 101, a New Nanotechnology/Energy Material Research and Development Platform from CVD Equipment Corporation
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7/7/10
CVD Equipment Corporation 2010 Orders Increase by 70%
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05/26/10
Graphene Laboratories Inc. and CVD Equipment Corporation sign Exclusive Distribution Agreement for CVD Graphene Products
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5/17/10
CVD Equipment Corporation Announces First Quarter Results
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5/4/10
Bloo Solar Selects CVD Equipment Corporation to Design and Manufacture Equipment for Transparent Conductive Oxide (TCO) Coatings
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4/1/10
CVD Equipment Corporation Reports Fiscal Year 2009 Results
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1/15/10
First Nano Lab mentioned in, PV-tech.org article, "Tangled up in Bloo (Solar): Start-up believes 3-D has a commercial not-too-distant future"
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12/01/09
CVD Equipment Corporation appears in the Brookhaven National Laboratory Newsletter, The Bulletin, article titled "Pushing the Envelope in Optics"
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© 2010 First Nano, a Division of CVD Equipment Corporation
1860 Smithtown Ave | Ronkonkoma, NY 11779 | Tel 631.981.7081 | Fax 631.981.7095
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