- Home
- Company
- Products
- About Products
- Download Literature
- Equipment Gallery Images
- EasyCrystal ™ Growth Furnace
- EasyPanel™
- EasyGas™ 1000
- EasyGas™ 1500
- EasyTube® 101
- EasyTube® 2000 System
- EasyTube®; 2000 - High Temperature Annealing System
- EasyTube™ 3000 System
- EasyTube® 3000 - Selenization/Sulfurization System
- EasyTube® 4000 - PECVD System
- EasyTube® 5000 - MOCVD System
- EasyTube® 6000 System
- EasyTube® 8000 - Fluidized Bed Reactor
- EasyTube® Comparison
- EasyExhaust® System
- First Nano's Application Lab
- Applications
- Application Lab
- Request a Quote
- Contact
 |
enabling tomorrow's technologies™ Request a Quote |
|
|
|
|
|
| Services and Solutions | Our Products | News and Press Releases | ||
First Nano manufactures custom turnkey thermal CVD & PECVD systems to meet the research & production needs in nanotechnology, solar, semiconductor and MEMS industries. Our Applications include:
We provide turnkey solutions with our:
We also provide access to our Application Lab where material processes can be developed in conjunction with First Nano/CVD research scientists. Please visit our Application Lab page for fees and more information. Customer Testimonials "With First Nano's EasyTube® 3000, the research team succeeded to produce 18 millimeter long CNT array which is considered the longest aligned CNT's reported ever." -Dr. Vesselin Shanov |
|
EasyCrystal™ Bridgman Furnace System
Vertical Growth (Bridgman) Furnace System is an advanced process tool for the growth of crystals... EasyPanel™ System
UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery... EasyExhaust™ System
High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally... EasyGas™ 1000
High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery... EasyGas™ 1500
Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment... EasyTube® 101
Advanced CVD process development tool for the University or Industrial Researcher... EasyTube® 2000
Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire... EasyTube®; 2000 - Fastcool™ Furnace
FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over... EasyTube® 2000 - Automated Wafer Loading
Ensures contamination-free handling and consistent gas sealing ... EasyTube® 2000 - Hot Loader and FastCool™ Furnace
Hot Loader to Load Sample into a Pre-Heated Chamber.... EasyTube® 2000 - HTA High Temperature Annealing System
Graphite Resistance Heated High Temperature Annealing (HTA) System is an automatically... EasyTube® 3000 - RF Plasma
Remote RF Plasma used to ionize gas prior to entering the thermal deposition... EasyTube® 3000 - CNT Batch Synthesis
Vertically aligned CNT's are produced on a batch of 4" wafers... EasyTube® 3000 - High Throughput Loader
The High Throughput Loader enables fast sample heating to improve nanotube... EasyTube® 3000 - Infrared Heating Furnace
Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability... EasyTube® 5000 MOCVD System
MOCVD System, advanced research Reactor for depositing a wide variety of III-V and II-VI layers... EasyTube® 6000
Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation... EasyTube® 8000 - Fluidized Bed Reactor
RF Induction Heated EasyTube® 8000 Series Fluidized Bed Chemical Vapor Deposition System is...
Upcoming Tradeshows
|
|
05/15/12 05/07/12 04/30/12 03/27/12 03/16/12 02/28/12 01/09/12 11/29/11 11/28/11 |
© 2012 First Nano, a division of CVD Equipment Corporation
1860 Smithtown Ave | Ronkonkoma, NY 11779 | Tel 631.981.7081 | Fax 631.981.7095
Home | Company | Products | Applications | Application Lab | RFQ | Contact | Privacy | www.firstnano.com
1860 Smithtown Ave | Ronkonkoma, NY 11779 | Tel 631.981.7081 | Fax 631.981.7095
Home | Company | Products | Applications | Application Lab | RFQ | Contact | Privacy | www.firstnano.com
