EasyCrystal™ Bridgman Furnace System

Vertical Growth (Bridgman) Furnace System is an advanced process tool for the growth of crystals...
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EasyPanel™ System

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
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EasyGas™ 1000

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube^® 101

Advanced CVD process development tool for the University or Industrial Researcher...
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EasyTube^® 2000

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube^® 2000 - VACNT Array

Vertically Aligned CNT array...
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EasyTube^® 2000 - Fastcool™ Furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
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EasyTube^® 2000 - Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube^® 2000 - Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
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EasyTube^® 2000 - HTA High Temperature Annealing System

Graphite Resistance Heated High Temperature Annealing (HTA) System is an automatically...
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EasyTube^® 3000

Advanced Catalytic CNT and Nanowire CVD System process tool for...
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EasyTube^® 3000 - High Purity Graphite Susceptor

Loadlock with a 3 inch wafer on a high purity graphite susceptor loading...
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EasyTube^® 3000 - RF Plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube^® 3000 - CNT's Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4″ wafers...
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EasyTube^® 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
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EasyTube^® 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
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EasyTube^® 4000 PECVD System

Advanced Plasma Enhanced CVD process tool for the synthesis of...
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EasyTube^® 5000 MOCVD System

MOCVD System, advanced research Reactor for depositing a wide variety of III-V and II-VI layers...
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EasyTube^® 6000

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
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EasyTube^® 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
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EasyTube^® 8000 - Fluidized Bed Reactor

RF Induction Heated EasyTube^®8000 Series Fluidized Bed Chemical Vapor Deposition System is...
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