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**See our new Easytube™ 101 configurator - our friendly, low cost, equipment/process solution for the researcher that has a limited budget.** First Nano, a Division of CVD Equipment Corporation, manufactures turnkey thermal CVD and PECVD systems to meet the research and production needs in nanotechnology, solar, semiconductor and MEMS industries. Our EasyTube™ systems, used for nanomaterial growth, include:
EasyTube™ systems are also used in thin film deposition including Silicon Germanium (SiGe), amorphous Silicon, micro-crystalline Silicon, graphene, Silicon Oxide, Silicon Nitride, TCO coating on glass and much more. We provide turnkey solutions with our EasyTube™ CVD systems, EasyGas™ cabinets, EasyPanels™, and EasyExhaust™ Gas Conditioning Systems (scrubber). We also provide access to our Application Lab where Nano/Solar/Energy material processes can be developed in conjunction with First Nano/CVD research scientists. Please visit our Application Lab page for fees and more information. Upcoming Shows & Conferences EXHIBITNG:
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EasyPanel™ System
UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery... EasyExhaust™ System
High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally... EasyGas™ 1000
High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery... EasyGas™ 1500
Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment... EasyTube™ 101
Advanced CVD process development tool for the University or Industrial Researcher... EasyTube™ 2000
Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire... EasyTube™ 2000 - Fastcool™ Furnace
FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over... EasyTube™ 2000 - Automated Wafer Loading
Ensures contamination-free handling and consistent gas sealing ... EasyTube™ 2000 - Hot Loader and FastCool™ Furnace
Hot Loader to Load Sample into a Pre-Heated Chamber.... EasyTube™ 3000 - RF Plasma
Remote RF Plasma used to ionize gas prior to entering the thermal deposition... EasyTube™ 3000 - CNT Batch Synthesis
Vertically aligned CNT's are produced on a batch of 4" wafers... EasyTube™ 3000 - High Throughput Loader
The High Throughput Loader enables fast sample heating to improve nanotube... EasyTube™ 3000 - Infrared Heating Furnace
Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability... EasyTube™ 6000
Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
Customer Testimonials "CVD’s core processes and application lab have enabled us to bring solutions and refinements to areas of our process development which have allowed us to accelerate the commercialization of our product..." -Larry Bawden |
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1860 Smithtown Ave | Ronkonkoma, NY 11779 | Tel 631.981.7081 | Fax 631.981.7095
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