EasyTube™ 101

Advanced CVD process development tool for the University or Industrial Researcher

Download ET 101 Brochure
Download Facility and System Layout Overview

Please try our system configurator at
www.firstnano.com/products/easytube101/config

Advanced R&D Platform for CNT, Nanowire, Graphene and other Thin Film Growth

First Nano’s EasyTube™ 101 System is an advanced Chemical Vapor Deposition process development tool for the University or Industrial Researcher. It is controlled by i) our proprietary real-time, LabWindow™ based process control software CVDWinPrC™ that provides recipe driven process control, real-time graphing and automatic data logging for optimal process reproducibility, ii) communicates with a PLC that handles the hardware interface and provides the appropriate, industrial level safety systems, and iii) has a standard Web connection interface that allows for remote training, software upgrades and system trouble shooting.

The EasyTube™ 101’s modular platform offers up to eight (8) input lines for gases. Three (3) of the input lines can be configured for solid or liquid sources. Heating is provided by either a resistance furnace or rapid thermal infrared lamps. The system can be configured for both vacuum and atmospheric processes. The 40 mm (ID) process tube has a usable processing area of 25x50mm and most system options are field upgradable.

The EasyTube™ 101’s system can be configured to run a wide range of processes – CNT's, Graphene, Nanowires, APCVD, LPCVD, Epitaxial, Oxides, Nitrides, Annealing, Diffusion, Chemical Vapor Infiltration, ALD using selected combinations of gaseous and/or liquid precursors.

The EasyTube™ 101 is the perfect research tool for next generation material growth and novel process development across many fields including nanoelectronics, semiconductor, photovoltaic, MEMS, composites, structural coatings, etc.

The EasyTube™ 101 is designed to meet today’s stringent safety standards. The system safely processes pyrophoric, corrosive, flammable and toxic gases such as Silane, Germane, Diborane, Hydrogen Chloride, Hydrogen and metal organic liquid source precursors with a fully developed safety system.

The EasyTube™ 101 is a user friendly, low cost, equipment/process solution for the researcher that has a limited budget and needs turn-key equipment with a baseline process recipe and proven safety system.

Please try our system configurator at
www.firstnano.com/products/easytube101/config to select the best option for your needs and to submit a request for quotation. You can also call us at (631) 981-7081 to speak with an application specialist or email us at sales@firstnano.com.

EasyTube™ 101 Standard Configuration:

• CVDWinPrC™ based process control software for Real Time Process Control, Data Logging, Multi-Graphing, Recipe Generation and Editing
• CVDWinPrC™interfaces with PLC hardware, thus providing additional safety features
• Comprehensive Software and Hardware Safety Interlocks
• Standard Preprogrammed Recipes for SW/MW CNT's, Nanowires, Annealing, Diffusion, Oxides,
  Nitrides, ALD, Epitaxial layers, etc.
• Resistance heating, high temperature, three-zone furnace for up to 1100 °C operation
• Atmospheric process operation
• Cantilevered automatic sample loading system
• Quartz Process Tube, Sample Holder, Gas Injector, and Profiling Thermocouple
• Dual O-Ring process seals with a vacuum monitoring system to insure leak free operation
• Four (4) Mass Flow Controlled UHP Gas Lines
• Meets SEMI - S2/S8 and CE certifications
• Factory Training for one (1) person including Hotel, Food and Local Transportation for four (4) days and three (3) nights
• One (1) Year Warranty

EasyTube™ 101 Optional Accessories/Services:

• Infrared (IR) heating for Rapid Thermal Processing (RTP) to 1100 °C in lieu of resistance heating
• Up to Four (4) additional gas input lines
• Purge/Reactant: inert gas purge for reactive gas lines
• Run/Vent: stabilizes gas flows (bypassing the Process Tube) before flowing into Process Tube
• Atmospheric or Low Pressure Liquid Source Vapor Delivery - maximum of three (3)
• Liquid Source Bubbler: 250ml or 500ml
• Air Pump - air feed into system for removing carbon residue in a CNT process tube
• Low Pressure Operation – configuration
  • 1000 Torr Capacitance Manometer
  • 10 Torr Capacitance Manometer
  • Butterfly Throttle Control Valve and closed loop Vacuum Controller
  • Inlet Assimilation (particle) Trap
  • Inlet Molecular Sieve Trap
  • 20 CFM Oil based Vacuum Pump
  • Exhaust Mist Eliminator
  • Optional – Fomblin Oil based Vacuum Pump
  • Optional – 50 CFM Dry Mechanical Screw pump
• Fast acting pneumatic valves for ALD operation
• Imperial (Inch) Tool Kit
• Seismic Mounts
• Wheels to allow easy movement of system into your laboratory
• Extended Warranty: 24 or 36 months
• Onsite system Starts-Up and Training
• EasyExhaust™ effluent gas treatment
  • EE-400 Burn Off System for flammable gases
  • EE-410 Pyrolizing and Wet Scrubbing system for flammable, toxic and corrosive gases
  • EE-460 Wet Scrubbing system for corrosive gases
  
• EasyGas™ Gas Cabinets for flammable, toxic, pyrophoric and corrosive gases - specify
• EasyPanel™ UHP Gas Panels for Argon, Nitrogen, Helium, Oxygen

* Note: Electrical varies with country; facilities requirements vary with system options. Consult Factory for details.