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First Nano offers turn-key system capabilities with support equipment such as Gas Cabinets and Exhaust Gas Conditioning Systems. All major components from one vendor makes interfacing easy.
The EasyTube™ product line is designed and manufactured modularly. All EasyTube™ systems offer standard configurations and modular options to meet the continuously emerging requirements. Most options can be added in the field.
Our EasyTube™ system is a fully automated operation system with computer controls and recipe driven process. It offers reliability, flexibility, and safety all in one platform.
First Nano provides recipes developed with our in house Application Lab for nanomaterials synthesis and thin film deposition with the system. We work closely with our customers to make better materials and equipments.
The EasyTube™ turn key solution is clearly the best choice for your materials synthesis.
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EasyPanel™ System

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
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EasyGas™ 1000

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube™ 101

Advanced CVD process development tool for the University or Industrial Researcher...
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EasyTube™ 2000

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube™ 2000 - VACNT Array

Vertically Aligned CNT array...
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EasyTube™ 2000 - Fastcool™ Furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
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EasyTube™ 2000 - Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube™ 2000 - Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
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EasyTube™ 3000

Advanced Catalytic CNT and Nanowire CVD System process tool for...
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EasyTube™ 3000 - RF Plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube™ 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4" wafers...
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EasyTube™ 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
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EasyTube™ 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
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EasyTube™ 4000

Advanced Plasma Enhanced CVD process tool for the synthesis of...
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EasyTube™ 4000 - PECVD Deposition Chamber

PECVD Deposition chamber for a 4", 6" or 8" wafer...
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EasyTube™ 6000

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
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EasyTube™ 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
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First Nano, a Division of
CVD Equipment Corporation
1860 Smithtown Avenue
Ronkonkoma, NY 11779 USA
(P) 631.981.7081
(F) 631.981.7095 |