EasyTube™ 6000

Advanced Multi -Tube Furnace System

Download ET 6000 Brochure

Modular Design with Flexability

First Nano's EasyTube™ 6000 Horizontal Furnace System is offered for Carbon Nanotubes (CNT), Nanowires, Oxidation, Annealing, Diffusion and Low Pressure Chemical Vapor Deposition (LPCVD) Our modular design offers flexibility of configuration with the cost savings of standardization.

Configured for Atmospheric or Vacuum Operation

EasyTube™ 6000 can be configured with one through four process tubes. Each tube can be configured for atmospheric or vacuum operation.

Cantilevered Loading System

EasyTube™ 6000 utilizes a Cantilevered Loading System and has an optional Horizontal HEPA Filtered Laminar Flow
Hood. This combination minimizes particle generation and allows the user to load pieces of wafers, a single wafer
or a boat of wafers.

Accurate Internal Temperature Profile

Cascade Temperature Control provides the most accurate internal temperature profile with the responsiveness of external (furnace) temperature monitoring and control. Each zone is controlled separately and can be tuned automatically to provide the best thermal response and profiles.

Meets Today's Most Stringent Safety Requirements

EasyTube™ 6000 System is designed to meet today’s more stringent safety requirements. Alarms are displayed on the monitor, audibly announced, data logged and can be remotely transmitted. The EasyTube™ 6000 ensures semiconductor manufacturing system levels of safety in a precision research tool under all growth conditions.

PC Controlled Recipe Driven Software

EasyTube™ 6000 Furnace System is easy to use with PC controlled recipe driven software that automatically acquires and data logs all vital parameters for verifiable repeatability. The system will graph and display in real-time all flows, pressure and temperatures.

EasyTube™ 6000 Standard Configuration

• Windows™ Based Computer Controlled Operation, Data Logging, Safety Interface, Recipe Creation
• One through Four Tube Configurations
• Cantilevered Automatic Loading System
• 3 Zone Resistance Furnace
• Proprietary Real-Time Cascade Temperature Control
• Wafer Sizes up to 200 mm
• Up to 100 Wafers Per Load
• Capable of Six (6) Mass Flow Controlled UHP Gas Lines Per Tube
• Atmospheric and Low Pressure Processing in any Tube
• Comprehensive Software and Hardware Safety Interlocks
• One (1) Year Warranty

Turn-Key Capabilities

EasyTube™ products are also offered in a single tube configuration with the EasyTube™ 2000 and EasyTube™ 3000 models. The EasyTube™ 6000 with it's multitube configuration allows the best utilization of available floor space. If current requirements only define two or three process tubes now, the system allows future processes to be added to the unused tube locations when the need arises.

First Nano offers turn-key system capabilities with support equipment such as Gas Cabinets and Exhaust Gas Conditioning Systems. All major components from one vendor makes interfacing easy. The First Nano EasyGas™ gas cabinet is capable of delivering a variety of toxic and hazardous gases. The Easy Exhaust™ System will thermally pyrolyze and wet scrub the process effluents.

Mounting
Left Hand
Right Hand
Bulkhead
Ballroom

* Note: Electrical varies with country; facilities requirements vary with system options. Consult Factory for details.