EasyTube^® 6000
Four (4) Tube Horizontal Furnace System

Download ET 6000 Brochure
Download Facility and System Layout Overview

Modular Design with Flexibility & Cost Savings

First Nano's EasyTube^® 6000 Horizontal Furnace System is offered for Carbon Nanotubes (CNT), Nanowires, Oxidation, Annealing, Diffusion and Low Pressure Chemical Vapor Deposition (LPCVD). Our modular design offers flexibility of configuration with the cost savings of standardization.

Configured for Atmospheric or Vacuum Operation

Our system can be configured with one through four process tubes. Each tube can be configured for atmospheric or vacuum operation.

Cantilevered Loading System

EasyTube^® 6000 utilizes a Cantilevered Loading System and has an optional Horizontal HEPA Filtered Laminar Flow Hood. This combination minimizes particle generation and allows the user to load pieces of wafers, a single wafer or a boat of wafers.

Cascade Temperature Control provides the most accurate internal temperature profile with the responsiveness of external (furnace) temperature monitoring and control. Each zone is controlled separately and can be tuned automatically to provide the best thermal response and profiles.

Innovative Modular Platform

Our modular platform houses key process components and multiple advanced options to meet your specific process requirements. Options are field upgradable.

Operated through our CVDWinPrC™ process control software that automatically logs data and graphically shows the time dependent values of user selected parameters.
CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check /create new recipes and view real time or saved execution data.

EasyTube^® 6000 Standard Configuration

• CVDWinPrC™ based process control software for Real Time Process Control, Data Logging and Display, Recipe Generation and Editing
• One through Four Tube Configurations
• Cantilevered Automatic Substrate Loading/Unloading System
• Wafer Sizes > 200mm (3 Stack Furnace), Wafer Sizes > 150mm (4 Stack Furnace)
• Up to 25-50 Per Load (Process Dependent). Larger Loads. Available on Request
• Proprietary Real-Time Cascade
• Process Temperature Control
• 4 Mass Flow Controlled UHP Gas Lines Per Tube
• Atmospheric and Low Pressure Processes Available
  
• User Settable Warnings and Alarms
• Application Customized Safety Systems
• Comprehensive Software and Hardware Safety Interlocks
• One (1) Year Warranty
• Semi - S2/S8 and CE Certified

Turn-Key Support Equipment Capabilities

EasyTube™ products are also offered in a single tube configuration with the EasyTube™ 2000 and EasyTube™ 3000 models. The EasyTube™ 6000 with it's multitube configuration allows the best utilization of available floor space. If current requirements only define two or three process tubes now, the system allows future processes to be added to the unused tube locations when the need arises.

First Nano offers turn-key system capabilities with support equipment such as Gas Cabinets and Exhaust Gas Conditioning Systems. All major components from one vendor makes interfacing easy. The First Nano EasyGas™ gas cabinet is capable of delivering a variety of toxic and hazardous gases. The EasyExhaust™ System will thermally pyrolyze and wet scrub the process effluents.

Processes:

CNT Batch Production
Oxidation:
Dry (Oxygen)
Wet (Bubbler)
Pyrogenic Oxidation using an independent chamber to generate pure steam

LPCVD
Polysilicon
Silicon Dioxide
Silicon Nitride
Silicon Oxynitride

Mounting
Left Hand
Right Hand
Bulkhead
Ballroom

* Note: Electrical varies with country; facilities requirements vary with system options. Consult Factory for details.

Please contact us for further details.