- Home
- Company
- Products
- About Products
- Download Literature
- Equipment Gallery Images
- EasyCrystal ™ Growth Furnace
- EasyPanel™
- EasyGas™ 1000
- EasyGas™ 1500
- EasyTube® 101
- EasyTube® 2000 System
- EasyTube® 2000 - High Temperature Annealing System
- EasyTube™ 3000 System
- EasyTube® 3000 - Selenization/Sulfurization System
- EasyTube® 4000 - PECVD System
- EasyTube® 5000 - MOCVD System
- EasyTube® 6000 System
- EasyTube® 8000 - Fluidized Bed Reactor
- EasyTube® Comparison
- EasyExhaust® System
- First Nano's Application Lab
- Applications
- Application Lab
- Request a Quote
- Contact
 |
enabling tomorrow's technologies™ |
|
EasyTube® 2000 - High Temperature Annealing System EasyTube® 3000 - Selenization/Sulfurization System |
|
EasyTube® 3000 System Features
EasyTube® 3000's modular platform houses several key process components including the process chamber, computer control system, auto loader, loadlock, pumps, UHP gas and vapor delivery system - all for maximum system flexibility. Options are field upgradable. Please contact us for further details on our equipment or lab use. |
© 2013 First Nano, a division of CVD Equipment Corporation
355 South Technology Drive | Central Islip, NY 11722 | Tel 631.981.7081 | Fax 631.981.7095
Home | Company | Products | Applications | Application Lab | RFQ | Contact | Privacy | www.firstnano.com
355 South Technology Drive | Central Islip, NY 11722 | Tel 631.981.7081 | Fax 631.981.7095
Home | Company | Products | Applications | Application Lab | RFQ | Contact | Privacy | www.firstnano.com
