EasyTube™ 101 Configuration
To customize your system please fill in the following form.
Download ET 101 Brochure Download Facility and System Layout Overview
What type of process do you want to run:
Select your Gas Lines and options here:
Enter (1) Chemical Name or Formula per line
Select Maximum Flow Rate (SLM)
Gas Leak Detection
Select if a Purge/Reactant option is needed
Select if a Run/Vent option is needed
Select type of Input Line (Gas or Bubbler)
Select Bubbler minimum Temp. (°C)
Select Bubbler maximum Temp. (°C)
Notes: 1. For Input Line #1: only AR, N2 or other inert gases can be chosen 2. For some reacting chemicals, for example Corrosive or Pyrophoric, we recommend choosing a Purge/Reactant and a Run/Vent option for optimal process operational safety, process repeatability and maximum system uptime.
Purge/Reactant: Improve component lifetime and process purity - Instead of a 2 port valve, a 3 port valve is used with appropriate line connections and other system upgrades. - Allows to clean out the lines with an inert gas before and after the Corrosive, Pyrophoric or other reacting chemicals are being flown through the mass flow controller. - Increases process control accuracy and minimizes clogging of valves and mass flow controllers. - This option is typically needed for bubblers and MOCVD chemicals.
Run/Vent: For sharp interface transition - Allows to establish a constant flow by flowing first to the exhaust through a separate vent line, thus providing a sharp growth rate transition step. - After the flow is established and stabilized, the Run/Vent valve switches the flow from the Vent line to the Process Line without a change in flow rates. - This option is typically needed for bubblers and MOCVD chemicals.
Process Heating Temperature determines the thermal barrier of chemical reactions. Choose among the factor of heating rate or temperature uniformity.
System & Process Controls
Process Pressure Option Pressure controls the reaction uniformity and structure characteristic. Choose among these capacities.
Pneumatic Valve Option Faster valve switching time improves ALD layer deposition cycle time.
Quartzware Parts Process tube, sample holder and gas injector are made from quartz, which is chemical inert to most CVD process gases.
Additional Accessory Options Bubblers need to be either purchased from CVD or provided by customer. If provided, consult factory for compatibility.
Gas Delivery Options Depending on the gas line you choose, you may need a gas delivery system.
Integrated Exhaust Treatment Options By-products from the chemical vapor deposition may need to be oxidized and/or neutralized before being exhausted to the atmosphere. The systems below provide you with different treatment options depending on your process exhaust conditions.
Standard and optional Services
Spares Parts Additional spare parts you might consider purchasing.
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Electrical Configuration
Warranty
Packaging/Transport
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First Nano ET101 services
Payment Terms to approved customers: 30/60/10