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EasyTube™
3000 System Features
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EasyTube 2000 Features
Download ET3000 Brochure
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 Industry
Research Model
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EasyTube™ 3000 System is the most advanced
thermal catalytic chemical
vapor deposition process
tool for the synthesis of
nanotube and nanowire. The system
was initially developed to
address materials research
challenges particular to the
semiconductor industry. The
EasyTube is now being used
for materials research across
many industries including,
protective coatings, advanced
sensors, structural coatings,
textiles, etc. The tool delivers
precise control over process
development with user safety
in mind.
EasyTube™ 3000 is the
solution for control over nanotube/nanowire synthesis
using a single precision tool
with total system flexibility. |
Industrial Safety
Standards - SEMI-S2, S8, S10 & CE Certified |
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EasyTube™ 3000 is designed to meet today’s
more stringent safety standards. Some
standard safety features include automatic
inert purge, redundant interlocks for all critical
alarm conditions, integrated gas leak detection,
exhaust gas dilution and more. Alarms are
displayed on the monitor, audibly announced,
data logged and can be remotely transmitted.
The EasyTube™ 3000 ensures semiconductor
industry level safety under all growth conditions.
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High Throughput |
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EasyTube™ 3000 cycle time with the High Throughput Loadlock enables fast
sample heating to improve nanotube quality and purity. The loadlock also
reduces overall process time and increases sample productivity by permitting
faster sample cooling from process temperature to room temperature in an
inert gas environment. |
Reaction
Chamber / Large Sample Capacity |
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EasyTube™ 3000 offers a quartz reaction chamber size of 3" or 5" for greater sample capacity and substrate options. The system can also use rectangular process tubes
for improved laminar gas
flow. |
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EasyTube™ 3000 Standard
Configuration:
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Windows™ based computer
controlled operations, data
logging, safety interface,
recipe generation
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Preprogrammed application
specific recipes for SWNT,
MWNT, vertically aligned
CNT, bulk CNT, nanowire
synthesis
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Resistance furnace for
process temperatures to > 1100 °C
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Proprietary real-time cascade
process temperature
control
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Cantilevered Automatic
loading system to eliminate
particulate
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3” Quartz reaction chamber
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Four (4) Mass Flow
Controlled UHP gas lines
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User settable warnings and
alarms for flows, temperatures,
pressures
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Over temperature protection
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CE certified
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EasyTube™ 3000’s modular platform houses
several key process components including the
process chamber, computer control system,
auto loader, loadlock, pumps, UHP gas and
vapor delivery system - all for maximum
system flexibily. Options are field upgradable. |
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The High Throughput Loader enables
fast sample heating to improve nanotube quality and purity.
The unique loader reduces overall process cycle time and
increases sample productivity by permitting faster sample cooling
from process temperature to room temperature in an inert gas
environment. |
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The optional Infrared heating furnace provides Rapid Thermal Process (RTP) capability. |
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EasyTube™ 3000 is capable of synthesizing a myriad of nanostructures
including basic single wall, multi-wall CNT’s and nanowires using selected
combinations of hydrides, liquid and solid precursors. |
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EasyTube™ 3000 Modular
Options:
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Multi-zone furnace with
proprietary real-time cascade
process temperature
control
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Resistance heating high
temperature furnace to > 1250 °C
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Infrared (IR) Heating for
Rapid Thermal Processing
(RTP) to 1150 °C
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Induction (RF) Heating for
process temperatures to > 1500 °C
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Loadlock for high
throughput
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Low Pressure Operation
(100 mtorr – 700 torr), < 50 mtorr base pressure
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Liquid Precursor Vapor
Delivery Kit
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Solid Source Vapor Delivery
Kit
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Process tubes to 5”
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Rectangular process tubes
for improved laminar gas
flow
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Additional Mass Flow
Controlled UHP gas lines
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DC Bias Field Assisted
Growth
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Plasma enhanced
deposition
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Semi S2, S8 certification
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