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First Nano, a division of CVD Equipment

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EasyCrystal™ Bridgman Furnace System

easycrystal vertical bridgman furnace

Vertical growth (Bridgman) furnace system is an advanced process tool for the growth of crystals...
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EasyGraphene™ Process Solutions

EasyGraphene™ Process Solution Equipment

Enables straightforward scaling of high quality CVD graphene from R&D to production quantities...
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EasyPanel™ System

easypanel uhp gas panel

UHP gas panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

easyexhaust system - high temp furnace and water scrubbing system

High temperature pyrolizing furnace and water scrubbing system capable of continually thermally...
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EasyGas™ 1000

easygas 1000 gas cabinet

High quality gas cabinets and gas delivery systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

easygas 1500 gas cabinet

Fully automated gas cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube® 101

easytube 101 advanced cvd process tool

Advanced CVD process development tool for the university or industrial researcher...
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EasyTube® 2000

easytube 2000 thermal cvd

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube® 2000 - VACNT Array

vertically aligned CNT

Vertically aligned CNT array...
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EasyTube® 2000 - Fastcool™ Furnace

high throughput furnace

FastCool™ furnace for high throughput, provides better temperature stability and uniformity over...
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EasyTube® 2000 - Automated Wafer Loading

easytube 2000 Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube® 2000 - Hot Loader and FastCool™ Furnace

Hot Loader and FastCool™ Furnace

Hot loader to load sample into a pre-heated chamber....
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EasyTube® 2000 - HTA High Temperature Annealing System

EasyTube® 2000 - HTA High Temperature Annealing System

Graphite resistance heated high temperature annealing (HTA) system is...
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EasyTube® 3000

easytube 3000 cnt and nanowire cvd system

Advanced catalytic CNT and nanowire CVD system process tool for...
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EasyTube® 3000 -High Purity Graphite Susceptor

Loadlock with a 3 inch wafer on a high purity graphite susceptor

Loadlock with a 3 inch wafer on a high purity graphite susceptor loading...
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EasyTube® 3000 - RF Plasma

easytube 3000 rf plasma

Remote RF plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube® 3000 - CNT's Batch Synthesis

EasyTube 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4" wafers...
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EasyTube® 3000 - High Throughput Loader

EasyTube 3000 - High Throughput Loader

The high throughput loader enables fast sample heating to improve nanotube...
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EasyTube® 3000 - Infrared Heating Furnace

EasyTube 3000 - Infrared Heating Furnace

Infrared heating furnace provides rapid thermal processing (RTP) capability...
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EasyTube® 4000 PECVD System

easytube 4000 advanced plasma cvd system

Advanced plasma enhanced CVD process tool, synthesis of nanomaterials and thin films...
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EasyTube® 5000 MOCVD System

easytube 500 mocvd equipment

MOCVD System, advanced research reactor for depositing a wide variety of III-V and II-VI layers...
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EasyTube® 6000 - Four (4) Tube Horizontal Furnace System

easytube 6000 advanced multi furnace system

Advanced multi-tube furnace system for carbon nanotubes (CNT), nanowires, oxidation...
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EasyTube® 6000 - Batch Wafer Process

EasyTube 6000 - Batch Wafer Process

Utilizes a cantilevered loading system, horizontal HEPA filtered laminar flow hood...
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EasyTube® 8000 - Fluidized Bed Reactor

EasyTube® 2000 - HTA High Temperature Annealing System

RF induction heated EasyTube® 8000 Series fluidized bed chemical vapor deposition system is...
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First Nano, a division of
CVD Equipment Corporation
355 South Technology Drive
Central Islip, NY 11722 USA
(P) 631.981.7081
(F) 631.981.7095


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355 South Technology Drive | Central Islip, NY 11722 | Tel 631.981.7081 | Fax 631.981.7095
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