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Customer Testimonials

"CVD’s core processes and application lab have enabled us to bring solutions and refinements to areas of our process development which have allowed us to accelerate the commercialization of our product. All solutions developed were also fully translatable into high volume manufacturing which will also help our company to reduce time to market. They are a good group to work with and have provided significant value"

-Larry Bawden
CEO
Bloo Solar    

"I am glad to share with you the good news that the ever since the very first batch of samples we continued to produce long and uniform silicon nanowires. Suffice to say that members of our research group are all impressed with the turn-key reliability as well as extensive safety features of this LPCVD system which greatly satisfy the needs of our fundamental research program in nanomaterials. We also appreciate the custom system design effort to cater to our needs from your  expert team and your ability to deliver and install in a timely manner."

-Jie Xiang
Assistant Professor of Electrical and Computer Engineering

University of California, San Diego

"The FN/CVD Application & Research Lab provides our company with one-stop CNT process capabilities and technical staff support that we simply cannot get anywhere else and that help us accelerate the commercialization of our proprietary thin film technologies"

-Vincent Stenger, Ph.D
Principal Research Engineer
SRICO, Inc

"EasyTube® provides a very versatile platform for
synthesizing various semiconductor nanowries. The configuration allows for consistent nanowire growths."

-Yi Gu, Ph.D
Assistant Professor of Physics, Gu Research Group
Washington State University

"The researchers at the University of Cinncinatti partnered with First Nano, a division of CVD Equipment Corp. of Ronkonkoma, N.Y., to use their laboratory and a specialized furnace called EasyTube® 3000.  With this equipment, the research team succeeded to produce 18 millimeter long CNT array which is considered the longest aligned CNT's reported ever."

- Dr. Vesselin Shanov
The University of Cincinatti

"It has been a pleasurable interaction with the First Nano process and development team. Collectively, collaborations between the Cornell Nanoscale Facility and First Nano have yielded single wall carbon wall nanotube growth from lithographically defined catalyst pads on full four inch wafers. Incorporating wafer scale nanoscale fabrication processes with predefined carbon based systems represents a major step forward in creating complex carbon based nanostructures. This enhanced functionality raises intriguing possibilities in modern scientific research of widely disparate endeavors."

-B. Rob Ilic, Ph.D
Research Associate - User Program Manager
Cornell Nanoscale Facility

"The purchase of the EasyTube™3000 will enlarge the spectrum of our research with the growth of heterostructured nanowires, their doping, and with the possibility to extend the growth to a wide variety of other materials thanks to the liquid precursor kits. Our projects cover fundamental aspects (growth, carrier transport …) as well as potential applications (Nano Electronics, Solar Energy, Nanophotonics, MEMS and Sensors)"

- Pascal Gentile
CEA Grenoble

"EasyTube™ provides the possibility for controlling the physical properties of nanotubes"

- Dr. Vesselin Shanov & Dr. Mark Schulz
The University of Cincinatti

"The turn-key EasyTube™ System is the most practical and convenient instrument for solutions in nanostructure synthesis”

- Dr. Wonbong Choi
Florida International University

EasyCrystal™ Bridgman Furnace System

easycrystal vertical bridgman furnace

Vertical Growth (Bridgman) Furnace System is an advanced process tool for the growth of crystals...
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EasyPanel™ System

easypanel uhp gas panel

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

easyexhaust system - high temp furnace and water scrubbing system

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
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EasyGas™ 1000

easygas 1000 gas cabinet

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

easygas 1500 gas cabinet

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube® 101

easytube 101 advanced cvd process tool

Advanced CVD process development tool for the University or Industrial Researcher...
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EasyTube® 2000

easytube 2000 thermal cvd

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube® 2000 - VACNT Array

vertically aligned CNT

Vertically Aligned CNT array...
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EasyTube®; 2000 - Fastcool™ Furnace

high throughput furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
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EasyTube® 2000 - Automated Wafer Loading

easytube 2000 Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube® 2000 - Hot Loader and FastCool™ Furnace

Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
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EasyTube® 2000 - HTA High Temperature Annealing System

EasyTube® 2000 - HTA High Temperature Annealing System

Graphite Resistance Heated High Temperature Annealing (HTA) System is an automatically...
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EasyTube® 3000

easytube 3000 cnt and nanowire cvd system

Advanced Catalytic CNT and Nanowire CVD System process tool for...
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EasyTube® 3000 - RF Plasma

easytube 3000 rf plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube® 3000 - CNT Batch Synthesis

EasyTube 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4" wafers...
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EasyTube® 3000 - High Throughput Loader

EasyTube 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
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EasyTube® 3000 - Infrared Heating Furnace

EasyTube 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
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EasyTube® 4000 PECVD System

easytube 4000 advanced plasma cvd system

Advanced Plasma Enhanced CVD process tool for the synthesis of...
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EasyTube® 5000 MOCVD System

easytube 6000 mocvd equipment

MOCVD System, advanced research Reactor for depositing a wide variety of III-V and II-VI layers...
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EasyTube® 6000

easytube 6000 advanced multi furnace system

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
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EasyTube® 6000 - Batch Wafer Process

EasyTube 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
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EasyTube® 8000 - Fluidized Bed Reactor

EasyTube® 2000 - HTA High Temperature Annealing System

RF Induction Heated EasyTube® 8000 Series Fluidized Bed Chemical Vapor Deposition System is...
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First Nano, a Division of
CVD Equipment Corporation
1860 Smithtown Avenue
Ronkonkoma, NY 11779 USA
(P) 631.981.7081
(F) 631.981.7095


© 2012 First Nano, a division of CVD Equipment Corporation
1860 Smithtown Ave | Ronkonkoma, NY 11779 | Tel 631.981.7081 | Fax 631.981.7095
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