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Chemical Vapor Deposition (CVD) for Industrial-Scale Production of Graphene Films

Download MRS 2010 Abstract pdf

Elena Polyakovai¹, Daniil Stolyarov1¹, Wei Zhangl², Thomas Salagaj², Karlheinz Strobl², Kirill Bolotin³

¹Graphene Laboratories Inc., 5 Archstone Cir. Suite 202, Reading, MA 01867
²CVD Equipment Corporation, 1860 Smithtown Ave, Ronkonkoma, NY 11779

Graphene materials are considered for potential use in a wide variety of practical applications including electronics, solar cells, MEMS and NEMS, chemical and biological sensors. Reproducible and cost effective manufacturing of wafer scale graphene films is one of the major roadblocks on the commercialization of the graphene nanomaterials.  Our team has successfully employed a CVD route via graphene growth on Ni or Cu catalyst films for the commercial production of a range of Graphene Products ranging from CVDGraphene™ TEM grids, CVDGraphene™ wafers, etc.  We report both on the commercial scale up progress and exploration and testing of the CVDGraphene™ films for various applications.  We will also show examples from our customers and collaborators who benefitted from using CVDGraphene™ products.


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