ALD Vertically Aligned CNT

Al2O3 ALD process performed in Roy Gordon’s Laboratory at Harvard University on First Nano supplied ~1.1mm tall VACNT arrays.

Unprocessed	ALD Coated
The untreated piece ~1.1mm CNT	~1.1mm vertical CNT's are coated with Al2O3

Processed

20μm depth

500μm depth

500μm depth