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EasyTube™
2000 System Features
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EasyTube 3000 Features
Download ET 2000 Brochure
 Innovate Modular Design
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EasyTube™ 2000’s modular platform houses
several key process components including the
process chamber, computer control system,
auto loader, pumps, UHP gas and vapor
delivery system - all for maximum system
flexibily. Options are field upgradable.
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Turnkey solution for nanomaterial synthesis |
EasyTube™ 2000 is an advanced
turnkey thermal catalytic
chemical vapor deposition
process tool for the synthesis
of a variety of nanotube and nanowire. The system is
optimized for controlled
process development and
user safety.
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Ready
to Run / Repeatable Results |
EasyTube™ 2000 enables precise computer control over key process
variables -time, temperature, gases and pressure. The system is delivered
ready to run after installation and features preprogrammed recipes to facilitate
your research. The user-friendly computer controlled recipe driven
software automatically acquires and logs run data for optimum repeatability and
reliable results. A multi-user login facilitates research organization and
data management.
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Easy to use |
EasyTube™ 2000 is easy to use with
PC controlled recipe
driven software that
automatically acquires
and logs data for
verifiable repeatability.
The graphical user
interface (GUI) allows
users to logically
access preprogrammed
recipes, modify and/or create recipes,
and view real time
execution data. |
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EasyTube 2000 Standard Configuration:
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Windows™ based computer
controlled operations
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Preprogrammed recipes for SWNT, MWNT, aligned CNT, nanowire
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Resistance furnace for temperatures to >1100 °C
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Proprietary real-time cascade process temperature control
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Cantilevered Automatic loading system
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3” Quartz reaction chamber
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Four (4) Mass Flow Controlled UHP gas lines
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User settable warnings and alarms
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Over temperature protection
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CE certified
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The EasyTube is the most advanced
turnkey system optimized for nanotube synthesis using a thermal CVD
process. The system is automatically control through software with recipe driven process. All data and events are automatically logged. |
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Three zone furnace with cascade control provides better temerature stability and uniformity over larger area. Internal thermal couple measures actual temperature over sample. Furnace lid opens automatically during cooling down stage to save time and improve productivity
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Automated sample loading ensures
contamination-free handling and consistent gas sealing integrity for
increased repeatability. The loader assembly is configured for
efficient loading and unloading, with double O-ring to provide reliable seal. |
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The mass
flow controllers ensure consistent and precise gas mixing. The mass
flow controller is integrated with the EasyTube custom
software user interface to provide computer-controlled time,
temperature and flow rate profiles from user-defined recipe files.
A maximum of twelve gas lines are available and are independently
controllable. Vapor delivery for liquid precursors is also
available. |
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EasyTube 2000 Modular
Component Options:
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Multi-zone furnace with
proprietary real-time cascade
process temperature
control
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Resistance heating high
temperature furnace to > 1250 °C
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Infrared (IR) Heating for
Rapid Thermal Processing
(RTP) to 1150 °C
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Low Pressure Operation
(100 mtorr – 700 torr), < 50 mtorr base pressure
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Liquid Precursor and Solid
Source Vapor Delivery Kit
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Rectangular process tubes
for improved laminar gas
flow
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Additional Mass Flow
Controlled UHP gas lines
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DC Bias Field Assisted
Growth
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Semi S2, S8 certification
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